Group-III Nitrides

  • Group-III nitrides are wide band gap semiconductors. They find application in the field of optoelectronics. The present work deals with various aspects of chemistry and materials synthesis of group-III nitrides, particularly GaN. The precursor chemistry of group-III nitrides focuses on the synthesis of group-III metal amides. MOCVD of group-III metal amides gave group-III nitride thin films. GaN nanostructures, e.g. nanopillars, nanorods and nanowires, were deposited using Bisazido(diethylaminopropyl)gallium \([(N_{3})_{2}Ga(CH_{2})_{3}NEt_{2}]\) as single molecule precursor. A set of quantitative CVD data, such as temperature distribution, mass flow of precursor and growth rate of GaN was generated to understand the MOCVD of group-III nitrides using single molecule precursor bisazido(dimethylaminopropyl)gallium \([(N_{3})_{2}Ga(CH_{2})_{3}NMe_{2}]\) in a vertical test reactor.

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Metadaten
Author:Jayaprakash KhanderiGND
URN:urn:nbn:de:hbz:294-15949
Subtitle (English):contribution to precusor chemistry, MOCVD, nanostructures and multiscale simulation studies
Referee:Roland A. FischerGND, Martin MuhlerORCiDGND, William S. SheldrickGND
Document Type:Doctoral Thesis
Language:English
Date of Publication (online):2006/05/11
Date of first Publication:2006/05/11
Publishing Institution:Ruhr-Universität Bochum, Universitätsbibliothek
Granting Institution:Ruhr-Universität Bochum, Fakultät für Chemie und Biochemie
Date of final exam:2006/02/28
Creating Corporation:Fakultät für Chemie und Biochemie
GND-Keyword:Nitride; Gallium; MOCVD-Verfahren; Nanostruktur; CVD-Verfahren
Institutes/Facilities:Lehrstuhl für Anorganische Chemie II, Organometallics & Materials Chemistry
Dewey Decimal Classification:Naturwissenschaften und Mathematik / Chemie, Kristallographie, Mineralogie
faculties:Fakultät für Chemie und Biochemie
Licence (German):License LogoKeine Creative Commons Lizenz - es gelten der Veröffentlichungsvertrag und das deutsche Urheberrecht